Products

System for experimental research and development

AFTEX-2300

Since this system is provided with just the basic functions of a solid source ECR plasma deposition system, it is more economical that an automatic deposition system.

  • Low temperature process
  • High refractive index control
  • High-speed reactive film formation
  • Condensation / flat film

In answer to strong demands from those involved in thin-film research, we have developed the competitively priced AFTEX-2300. While inexpensive, it has a microwave branch coupling type of ECR ion source installed and is equipped with a load lock mechanism and turbo molecular pump, to provide top performance. This is the optimal system for research into thin films of materials such as oxides and nitrides.

  • Deposition Characteristics
  • Product Features
  • Standard Specification
  • Principles and Features of ECR Plasma Deposition
Deposition Characteristics
Product Features
Standard Specification
Principles and Features of ECR Plasma Deposition

Drawing & Diagram



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