ECR Pasma Deposition Systems
The ECR plasma deposition method enables the formation of precise, smooth, high-quality thin films, at low temperatures and with low damage. This is leading-edge technology that is essential in the manufacturing processes of today’s electronic components.
The ECR plasma deposition systems that use this ECR plasma deposition method are the optimal systems in the wide range of fields necessary for low-temperature, low-damage deposition. These systems are particularly essential in the manufacturing process (edge surface coating) of various types of high-power semiconductor laser, such as ultraviolet, red, and infrared lasers. We are also active in processes for manufacturing GMR heads for hard disks and SAW devices.
In addition to the systems described below, we have a large lineup of other equipment, such as small-scale ion sources and equipment capable of handling large-scale substrates. For details, please contact us.