The ECR plasma deposition method enables the formation of precise, smooth, high-quality thin films, at low temperatures and with low damage. This is leading-edge technology that is essential in the manufacturing processes of today’s electronic components.
ALD method is a thin film deposition method realizing superior step coverage and film-thickness controllability. Even in the structure having high aspect ratio or complex 3D configuration, it is possible to form thin films controlled at the atomic level.
At JSW AFTY, we are involved in improving quality in the three areas of “equipment development and manufacture”, “technical advice”, and “after-sales services”, based on the concept of “Create new value for society by deposition technology and deposition systems”.
JSW AFTY is working towards bringing the technological resources and latent capabilities we have developed and accumulated up until now to fruition. We are also focusing on improvements in these resources and the development of new technologies, to bring about a prosperous future for our customers, us, and society through these efforts.